C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/33
C11D 7/26 (2006.01) C11D 1/44 (2006.01) C11D 3/43 (2006.01) C11D 7/32 (2006.01) C11D 7/50 (2006.01) C23G 5/032 (2006.01) H05K 3/26 (2006.01)
Patent
CA 2100053
A cleaning agent composition and method, especially for cleaning electonic components, optical parts, and circuit boards. The liquid agent is completely CFC-free and biologically harmless. The composition includes a dipropylene glycol monoether and one or more of the followings N-alkyl-lactame; dihydro- 2(3H) - furanone; a polypropylene glycol ether, R4 -CH(-OH)-CH2-NH2; N(R5)3; R6-N [(CH2-CH2O)n H] wherein R4 is a chain of 1-6 carbons, R5 is a chain of 2-18 carbons, R6 is a chain of 8-18 carbons and n is a number between 2 and 25.
Hanek Martin
Wack Oskar
Dr. O.k Wack Chemie Gmbh
Marks & Clerk
Zestron Gmbh & Co. Kg
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