Cleaning by cavitation in liquefied gas

Details Cleaning by cavitation in liquefied gas Cleaning by cavitation in liquefied gas

B - Operations, Transporting

08

B

B08B 3/12 (2006.01) B08B 7/00 (2006.01) D06F 19/00 (2006.01) D06F 43/00 (2006.01) D06F 43/08 (2006.01) H05K 3/26 (2006.01)

Patent

CA 2101142

CLEANING BY CAVITATION IN LIQUEFIED GAS ABSTRACT OF THE DISCLOSURE Undesired material is removed from a chosen substrate (28) by a process comprising the steps of (a) placing the substrate containing the undesired material in a cleaning chamber (12) provided with cavitation-producing means (16, 36, 52); (b) introducing a liquefied gas, such as liquid carbon dioxide, into the cleaning chamber and contacting the substrate containing the undesired material with the liquid carbon dioxide at a temperature below its critical temperature; and (c) exposing the liquid carbon dioxide to the cavitation-producing means for a period of time suffi- cient to remove the undesired material form the substrate. The substrate containing the undesired material may option- ally be contacted with carbon dioxide in the dense phase prior to and/or after the cavitation treatment to aid in removal of the undesired material. Further, spend liquid carbon dioxide may be treated to regenerate fresh liquid carbon dioxide which is recycled to the cleaning chamber. Other gases besides carbon dioxide which may be used in- clude nitrous oxide, sulfur hexafluoride, and xenon.

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