C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/835 (2006.01) C11D 3/30 (2006.01) C11D 1/62 (2006.01) C11D 1/66 (2006.01) C11D 1/72 (2006.01)
Patent
CA 2272607
The specification disloses improved compositions which both clean a surface and are believed to deposit thereupon a layer of cationic surfactant which assists the release of soil subsequently deposited upon said surface. These comprise a surfactant mixture, wherein said surfactant mixture itself comprises: a) at least 65 wt.% on total surfactant of nonionic surfactant; b) less than 1 wt.% on total surfactant of anionic surfactant; c) 0.1-35 wt.% on total surfactant of a cationic surfactant which is a mono fatty alkyl quaternary ammonium compound wherein the alkyl chains comprise at least 10 % of C18-C26 alkyl groups; wherein said composition further comprises, at least 0.5 wt.% of an organic amine having a pKa of at least 8Ø
L'invention concerne des compositions améliorées qui permettent à la fois de nettoyer une surface et sont susceptibles de déposer sur celle-ci une couche de tensio-actif cationique qui facilite l'élimination de souillures déposées ultérieurement sur ladite surface. Ces compositions renferment un mélange de tensio-actifs, ledit mélange de tensio-actifs comportant lui-même: a) au moins 65 % en poids de tensio-actif non ionique sur la quantité totale de tensio-actifs; b) moins de 1 % en poids de tensio-actif anionique sur la quantité totale de tensio-actifs; c) entre 0,1 et 35 % en poids sur la quantité totale de tensio-actifs, d'un tensio-actif cationique qui est un composé d'ammonium quaternaire de monoalkyle gras dans lequel les chaînes d'alkyle comportent au moins 10 % de groupes C18-C26 alkyle. Ladite composition renferme en outre au moins 0,5 % en poids d'une amine organique ayant un pKa d'au moins 8.
Leach Matthew James
Niwata Yoshihisa
Bereskin & Parr
Plc Unilever
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