C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/39
C11D 3/37 (2006.01) B01D 12/00 (2006.01) C11D 1/02 (2006.01) C11D 1/29 (2006.01) C11D 1/34 (2006.01) C11D 1/62 (2006.01) C11D 1/66 (2006.01) C11D 3/16 (2006.01) C11D 3/43 (2006.01) C11D 7/50 (2006.01) C11D 11/00 (2006.01) C23G 1/24 (2006.01) C23G 5/032 (2006.01)
Patent
CA 2034488
A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: Image ... ... ... (I) (wherein R1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: Image ... ... ... (II) (wherein R1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent, polyoxyalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to freon containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained. In addition, to use as a dewatering cleaning agent, the low molecular weight polyorganosiloxane is additionally mixed alone or with a surfactant and/or a hydrophilic solvent. Accordingly, cleaning and water substituting properties equivalent to freon containing dewatering cleaning agents and environmental safety can be obtained.
Imajo Yasutaka
Inada Minoru
Kabuki Kimiaki
Kurita Akitsugu
Oguni Takayuki
Kabushiki Kaisha Toshiba
Marks & Clerk
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