Cleaning compositions for hard to remove organic material

Details Cleaning compositions for hard to remove organic material Cleaning compositions for hard to remove organic material

C - Chemistry, Metallurgy

11

D

C11D 3/395 (2006.01) C11D 1/68 (2006.01) C11D 1/72 (2006.01) C11D 1/722 (2006.01) C11D 1/825 (2006.01) C11D 3/39 (2006.01)

Patent

CA 2647330

An oxidizing cleaning composition comprises a low concentration of aqueous hydrogen peroxide that is environmentally friendly and has good stability in strong alkaline solutions. The aqueous hydrogen peroxide composition contains a synergistic combination of one or more hydrophilic surfactants having an HLB of 10 or greater, one or more hydrotropes, one or more UV-analyzable surfactants having an aromatic detectable functional group, and optionally a surfactant having an HLB of less than 10. The cleaning composition when mixed with an alkaline compound is very effective in removing dried or baked residues of polymers, modified or natural celluloses starches, natural gels, and the like at low concentrations and temperatures.

Une composition nettoyante oxydante comprend une faible concentration de peroxyde d'hydrogène aqueux respectueuse de l'environnement et bien stable dans les solutions alcalines fortes. La composition de peroxyde d'hydrogène aqueux contient une combinaison synergétique d'un ou plusieurs tensioactifs hydrophiles d'un rapport hydrophile-lipophile d'au moins 10, d'un ou de plusieurs hydrotropes, d'un ou plusieurs tensioactifs analysables par UV et portant un groupe fonctionnel aromatique détectable, et éventuellement d'un tensioactif d'un rapport hydrophile-lipophile inférieur à 10. Mélangée à un composé alcalin, la composition nettoyante est très efficace pour retirer les résidus secs ou cuits de polymères, les amidons modifiés ou naturels des celluloses, les gels naturels, et analogues à faibles concentrations et températures.

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