C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/50 (2006.01) C11D 1/83 (2006.01)
Patent
CA 2597897
Disclosed is a cleaning composition that contains at least two surfactants selected from a cationic surfactant, a nonionic surfactants, a linear alkyl benzene sulfonate salt, a sulfated alcohol ethoxylate, an amine oxide, and an amphoteric surfactant; and a fragrance compound. The cleaning composition has a Cup test value of at least about 70% of the standard reference formula and a QFR value of at least about 20%. Also disclosed are related methods of fragrance delivery including application and use of the composition.
La présente invention a trait à une composition de nettoyage contenant au moins deux tensioactifs choisis parmi un tensioactif cationique, des tensioactifs non ioniques, un sel de sulfonate d'alkyle benzène linéaire, et un éthoxylat d'alcool sulfaté, un oxyde d'amine, et un tensioactif amphotère; et un composé de parfum. La composition de nettoyage présente une valeur de test Cup égale ou supérieure à environ 70 % de la formule de référence standard et une valeur de libération quantifiée de parfum (QFR) égale ou supérieure à 20 %. L'invention a également trait à des procédés associés de distribution de parfum comprenant l'application et l'utilisation de la composition.
Gambogi Joan
Kennedy Sharon
Murphy Cynthia
Smith Daniel
Szewczyk Gregory
Colgate-Palmolive Company
Smart & Biggar
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