C - Chemistry – Metallurgy – 23 – G
Patent
C - Chemistry, Metallurgy
23
G
C23G 5/02 (2006.01) B01D 12/00 (2006.01) C08G 65/00 (2006.01) C08L 71/02 (2006.01) C11D 3/00 (2006.01) C11D 3/16 (2006.01) C11D 3/18 (2006.01) C11D 3/37 (2006.01) C11D 3/43 (2006.01) C11D 7/50 (2006.01) C11D 11/00 (2006.01) C23G 5/024 (2006.01) C23G 5/032 (2006.01) C23G 5/04 (2006.01) C11D 1/29 (2006.01) C11D 1/34 (2006.01) C11D 1/40 (2006.01) C11D 1/62 (2006.01) C11D 1/74 (2006.01) C11D 3/20 (2006.01) C11D 7/24 (2006.01) C11D 7/26 (2006.01) C11D 7/28 (2006.01) H05K 3/26 (2006.01)
Patent
CA 2050333
Abstract of the Disclosure An object to be cleaned is cleaned with an cleaning agent which mixes a base cleaning agent such as silicon-containing cleaning agent or an isoparaffin containing cleaning agent with a surfactant or a hydrophilic solvent to promote the cleaning power. The object is rinsed with the base cleaning agent alone after it goes through the first cleaning step as described above. Then, this is followed by the finishing treatment by the use of hot air or steam drying. The base cleaning agents can be recovered and recycled, improving economy in the case with the use of two or more cleaning agents in combination. The excellent properties of degreasing and dewatering, comparable to those of flon system, can be obtained using a mixture of silicon-containing or isoparaffin-containing cleaning agents with surfactants and hydrophilic solvents and maintaining safety in environment.
Imajo Yasutaka
Inada Minoru
Kabuki Kimiaki
Saitoh Nobuhiro
Yagi Noriaki
Japan Field Company Ltd.
Kabushiki Kaisha Toshiba
Marks & Clerk
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