Cleaning of equipment used in a liquid phase oxidation process

Details Cleaning of equipment used in a liquid phase oxidation process Cleaning of equipment used in a liquid phase oxidation process

C - Chemistry, Metallurgy

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C23G 1/08 (2006.01) C11D 1/38 (2006.01) C11D 1/62 (2006.01) C11D 3/02 (2006.01) C11D 3/33 (2006.01) C11D 7/26 (2006.01) C11D 7/32 (2006.01)

Patent

CA 2031874

Composition for cleaning equipment used in a liquid phase oxidation process comprising an aqueous solution of between 3 and 30 %mass of a salt of sulphurous acid, between 0.5 and 30 %mass of a chelating agent and between 0.05 and 5 %mass of a cationic surfactant.

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