Cleaning solution for apparatuses used for production of...

Details Cleaning solution for apparatuses used for production of... Cleaning solution for apparatuses used for production of...

C - Chemistry, Metallurgy

23

G

C23G 5/02 (2006.01) C11D 3/00 (2006.01) C11D 7/32 (2006.01) C11D 7/50 (2006.01) G03F 7/022 (2006.01) C11D 7/26 (2006.01) C11D 7/28 (2006.01)

Patent

CA 2123193

ABSTRACT The present invention provides a cleaning solution excellent in cleaning efficiency which is used for cleaning apparatuses for producing photosensitive agents, apparatuses for preparing positive type resist solutions or spin coater line pipings. The invention further provides a practically useful cleaning method. The cleaning solution is characterized by containing N-methylpyrrolidone and the cleaning method is carried out using the cleaning solution.

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