C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 7/30 (2006.01) B01D 12/00 (2006.01) C07C 23/06 (2006.01) C07C 23/08 (2006.01) C11D 7/24 (2006.01) C11D 7/26 (2006.01) C11D 7/50 (2006.01) C23G 5/028 (2006.01) F26B 5/00 (2006.01) C11D 7/28 (2006.01)
Patent
CA 2147178
A cleaning solvent composition comprising at least one selected from the group5 consisting of 1H,2H/- hexafluorocyclobutane, 1,2,2,3,3-pentafluoro-cyclobutane, 1,2,2,3,3,4,4,5,5-nonafluorocyclopentane, 1H/2H- octafluorocyclopentane, 1H,2H/-octafluorocyclopentane, 1H/3H-octafluorocyclopentane, 1H,4H,2H/-heptafluoro- cyclopentane, 1H,2H/4H-heptafluorocyclopentane, 1H,2H,4H/-heptafluorocyclopentane, 1H,3H/2H-heptafluorocyclopentane, 1H,2H/3H- heptafluorocyclopentane and 1H,2H/3H-heptafluoro- cyclopentane and a method for cleaning or drying articles employing thereof and use of the composition as a cleaning agent.
Sont décrit une composition de solvant de nettoyage comprenant au moins un élément sélectionné dans le groupe composé de 1H,2H/hexafluorocyclobutane, 1,2,2,3,3-pentafluorocyclobutane, 1,2,2,3,3,4,4,5,5-nonafluorocyclopentane, 1H/2H-octafluorocyclopentane, 1H,2H/-octafluorocyclopentane, 1H/3H-octafluorocyclopentane, 1H,4H,2H/-heptafluorocyclopentane, 1H,2H/4H-heptafluorocyclopentane, 1H,2H,4H/-heptafluorocyclopentane, 1H,3H/2H-heptafluorocyclopentane, 1H,2H/3H-heptafluorocyclopentane et un groupe 1H,2H/3H-heptafluorocyclopentane; ainsi qu'un procédé de nettoyage ou de séchage d'articles avec ladite composition, et son utilisation comme détergent.
Aoyama Hirokazu
Ide Satoshi
Matsuda Takahiro
Yamamoto Akinori
Cassan Maclean
Daikin Industries Ltd.
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