Cleaning with controlled release of acid

C - Chemistry – Metallurgy – 11 – D

Patent

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Details

C11D 3/20 (2006.01) C11D 3/00 (2006.01) C11D 3/37 (2006.01) C11D 17/00 (2006.01)

Patent

CA 2757937

The present invention discloses a method for cleaning a substrate comprising contacting the substrate in a cleaning cycle with an aqueous cleaning solution comprising an aqueous diluent and a detergent composition, the detergent composition comprising a glycolic and/or lactic acid oligomer with an average degree of polymerization between 1.8 and 6. The glycolic and/or lactic acid oligomer provides a controlled release of glycolic and/or lactic acid in the cleaning solution generating an acidic pH gradient in the cleaning solution during the cleaning cycle. Preferably, the substrate is contacted in a rinse cycle with an aqueous rinse which is substantially free of an intentionally added rinse agent or fabric softener.

La présente invention porte sur un procédé pour le nettoyage d'un substrat comprenant la mise en contact du substrat lors d'un cycle de nettoyage avec une solution aqueuse de nettoyage comprenant un diluant aqueux et une composition de détergent, la composition de détergent comprenant un oligomère d'acide glycolique et/ou lactique ayant un degré moyen de polymérisation compris entre 1,8 et 6. L'oligomère d'acide glycolique et/ou lactique permet une libération contrôlée d'acide glycolique et/ou lactique dans la solution de nettoyage produisant un gradient de pH acide dans la solution de nettoyage pendant le cycle de nettoyage. De préférence, le substrat est mis en contact lors d'un cycle de rinçage avec une solution aqueuse de rinçage qui est pratiquement exempte d'un agent de rinçage intentionnellement ajouté ou d'un produit assouplissant.

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