Clear aqueous developers for lithographic plates including...

G - Physics – 03 – G

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G03G 9/16 (2006.01) G03C 5/24 (1980.01)

Patent

CA 1150089

Case 790315 CLEAR AQUEOUS DEVELOPERS FOR PHOTOPOLYMER LITHOGRAPHIC PLATES Abstract of the Disclosure A single-phase, non-emulsion aqueous solution subtractive developer for lithographic plates having photopolymer coatings is provided. These clear developers are aqueous solutions in- cluding an active or primary solvent which is only partially soluble in water and which is a good solvent for the photopolymer of a lithographic plate that has not been exposed to and insolublized by actinic radiation, this active solvent typically being present at a concentration near its water solubility limit. Preferably, a cosolvent is also included to increase the water solubility of the active solvent when necessary. A desensitizer may be included to impart to the formulation the properties of a one-step developer or of a finisher, the desensitizer being a hydrophilic synthetic resin. Formulation and development methods for these developers are also included, and they may be used either as developers or as a machine developer solution replenisher.

324931

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