Closed loop photographic process wastewater treatment system...

Details Closed loop photographic process wastewater treatment system... Closed loop photographic process wastewater treatment system...

C - Chemistry, Metallurgy

02

F

C02F 1/44 (2006.01) B01D 3/10 (2006.01) B01D 61/02 (2006.01) B01D 61/14 (2006.01) C02F 1/32 (2006.01) C02F 1/42 (2006.01)

Patent

CA 2044107

ABSTRACT A closed loop system for treating wastewater from a photographic process comprising chemical compounds used in the system is described. A processfor carrying out the system is also described. The system and process include an inlet zone for introducing wastewater from the photographic process, a filtration zone for the wastewater capable of producing a filtrate substantially free from the chemical compounds, and an outlet zone for introducing the filtrate as fresh wash water to the photographic process. The system is useful in recycling substantially all of the water used during the photographic process. Thus, the need for additional make-up water may be minimized.

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