Cmp composition containing silane modified abrasive particles

Details Cmp composition containing silane modified abrasive particles Cmp composition containing silane modified abrasive particles

C - Chemistry, Metallurgy

09

G

C09G 1/02 (2006.01) C09G 1/00 (2006.01) C09K 3/14 (2006.01)

Patent

CA 2378492

A polishing composition comprising a dispersion of silane modified abrasive particles formed by combining at least one metal oxide abrasive having at least one surface metal hydroxide with at least one silane compound and methods for polishing substrate features such as metal features and oxide features using the polishing compositions.

L'invention concerne une composition de polissage comprenant une dispersion de particules abrasives modifiées au silane, formées en combinant au moins un abrasif d'oxyde métallique ayant au moins un hydroxyde métallique superficiel, avec au moins un composé de silane. L'invention concerne en outre des procédés de polissage de substrats présentant les caractéristiques de métaux et d'oxydes, procédés utilisant lesdites compositions de polissage.

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