Coated substrate and process for its formation

Details Coated substrate and process for its formation Coated substrate and process for its formation

C - Chemistry, Metallurgy

23

C

C23C 14/10 (2006.01) C03C 17/34 (2006.01) C03C 17/36 (2006.01) C23C 14/06 (2006.01) C23C 14/08 (2006.01)

Patent

CA 2156571

A coated substrate is described comprising a substrate and at least one primary coating layer formed thereon. The product is characterised by an exposed protective additional layer formed thereon by cathode vacuum sputtering. The protective layer is selected from oxides and oxynitrides of silicon, and mixtures of one or more of oxides, nitrides and oxynitrides of silicon and has a refractive index of less than 1.7 and a thickness of from 1 to 10 nm. The product has improved chemical and mechanical durability, while any consequential changes in the optical properties are minimised.

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