C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
117/74, 204/96.0
C23C 14/30 (2006.01) C23C 14/02 (2006.01) C23C 14/32 (2006.01) C23C 14/46 (2006.01)
Patent
CA 2020708
ABSTRACT Disclosed herein is a coated substrate and a process for forming films on substrates and for providing a particularly smooth film on a substrate. The method of this invention involves subjecting a surface of a substrate to contact with a stream of ions of an inert gas having sufficient force and energy to substantially change the surface characteristics of said substrate, and then exposing a film-forming material to a stream of ions of an inert gas having sufficient energy to vaporize the atoms of said film-forming material and to transmit the vaporized atoms to the substrate surface with sufficient force to form a film bonded to the substrate. This process is particularly useful commercially because it forms strong bonds at room temperature. This invention is particularly useful for adhering a gold film to diamond and forming ohmic electrodes on diamond, but also can be used to bond other films to substrates.
Childs Charles B.
Chu Wei-Kan
Childs Charles B.
Chu Wei-Kan
Gowling Lafleur Henderson Llp
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