Coating process for manufacture or reprocessing of sputter...

C - Chemistry – Metallurgy – 23 – C

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C23C 14/34 (2006.01) C23C 24/04 (2006.01) H01J 35/00 (2006.01)

Patent

CA 2607091

Disclosed is a process for the reprocessing or production of a sputter target or an X-ray anode wherein a gas flow forms a gas/powder mixture with a powder of a material chosen from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, mixtures of two or more thereof and alloys thereof with at least two thereof or with other metals, the powder has a particle size of 0.5 to 150 ~m, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed on to the surface of the object to be reprocessed or produced.

L'invention concerne un procédé de retraitement ou de production d'une cible de pulvérisation ou d'une anode à rayons X, dans lequel un flux de gaz forme un mélange de gaz/poudre avec une poudre faite d'un matériau choisi dans le groupe composé de niobium, tantale, tungstène, molybdène, titane, zirconium, des mélanges de deux ou de plusieurs d'entre eux et des alliages de ceux-ci, avec au moins deux desdits éléments ou avec d'autres métaux. La poudre présente une dimension de particule de 0,5 à 150 ?m. Une vitesse supersonique est conférée au flux de gaz, et le jet à vitesse supersonique est dirigé sur la surface de l'objet à retraiter ou à produire.

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