Coating solution for forming transparent silica coating film...

C - Chemistry – Metallurgy – 09 – D

Patent

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C09D 183/04 (2006.01) C03C 1/00 (2006.01) C03C 17/25 (2006.01) C03C 17/34 (2006.01) C09D 1/00 (2006.01) C09D 133/26 (2006.01) C09D 139/00 (2006.01) C09D 183/02 (2006.01)

Patent

CA 2402678

The invention provides a coating solution for forming transparent silica coating film which solution is stable and can readily form comparatively thick silica coating film on a substrate through single application of the coating solution without use of an organic solvent. The invention also provides a method for producing transparent silica coating film. The coating solution comprising an aqueous solution contains at least one silicon compound which is selected from the group consisting of silicon oxide, silicic acid, and a silicic acid hydrate and which has been modified whereby having silanol groups; a strong organic base; and a water- soluble polymer, wherein the silicon compound is dissolved in the aqueous solution in presence of the strong organic base.

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