Coil having parallel paths having about the same electrical...

Details Coil having parallel paths having about the same electrical... Coil having parallel paths having about the same electrical...

H - Electricity

05

H

H05H 1/46 (2006.01) H01L 21/3065 (2006.01)

Patent

CA 2523264

A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

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