Cold antireflection layer deposition process

Details Cold antireflection layer deposition process Cold antireflection layer deposition process

C - Chemistry, Metallurgy

23

C

C23C 14/06 (2006.01) G02B 1/00 (2006.01) G02B 1/11 (2006.01)

Patent

CA 2429150

The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150 ~C, comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4'), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

Un procédé de fabrication d'un empilement anti-reflets par évaporation sous vide sur un substrat organique (1) à une température inférieure à 150·C, comportant les étapes de dépôt d'au moins une couche de matériau d'indice de réfraction différent de celui du MgF¿2? (4, 4'), de la préparation de la surface du substrat ainsi revêtu, et du dépôt d'une couche extérieure de MgF¿2? (5) sans assistance ionique. L'empilement anti-reflets sur substrat organique ainsi obtenu présente une bonne adhérence et une bonne résistance aux rayures. Application à la fabrication de lentilles ophtalmiques.

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