Colloid sensitization followed by acid rinse for electroless...

C - Chemistry – Metallurgy – 23 – C

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117/77

C23C 18/28 (2006.01) C23C 18/40 (2006.01) H05K 3/18 (2006.01)

Patent

CA 1047331

PROCESS FOR ELECTROLESS PLATING USING COLLOID SENSITIZATION Abstract of the Disclosure A process is described for the electroless deposition of metals on nonmetallic surfaces. The process involves pretreatment of the nonmetallic surface so as to obtain a surface finish suitable for deposition of colloidal sensitizers which catalyze electroless metallic deposition. The nonmetallic surface is then exposed to a colloidal catalyst solution (typically SnCl2/PdCl2) followed by an acid rinse. On completion of this surface activation procedure, the surface is exposed to a bath for the electroless deposition of metal. This procedure, which differs from that traditionally used, insures more reliable catalyst for electroless deposition of metals with shorter initiation times and is simpler in procedure and lower in cost. - i -

251548

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Colloid sensitization followed by acid rinse for electroless... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Colloid sensitization followed by acid rinse for electroless..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Colloid sensitization followed by acid rinse for electroless... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-284980

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.