Combined multiple beam size and spiral scan method for...

Details Combined multiple beam size and spiral scan method for... Combined multiple beam size and spiral scan method for...

G - Physics

01

N

356/176

G01N 23/04 (2006.01) H01J 37/00 (2006.01) H01J 37/30 (2006.01) H01J 37/302 (2006.01) H01L 21/00 (2006.01)

Patent

CA 1043912

A COMBINED MULTIPLE BEAM SIZE AND SPIRAL SCAN METHOD FOR ELECTRON BEAM WRITING OF MICROCIRCUIT PATTERNS ABSTRACT OF THE DISCLOSURE: A method for electron beam writing of microcircuit patterns utilizing the combination of spiral scan techniques and variable beam sizes. The circuit patterns are outlined in a spiral scan motion using a small size beam in order to ensure good edge sharpness and accuracy. The beam is then increased in size to fill-in the inside area of the pattern. Increasing the beam size increases the beam current and, correspondingly, the exposure speed and system throughput.

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