Combined plasma/liquid cleaning of substrates

Details Combined plasma/liquid cleaning of substrates Combined plasma/liquid cleaning of substrates

B - Operations, Transporting

08

B

B08B 3/00 (2006.01) B08B 3/02 (2006.01) B08B 3/04 (2006.01) B08B 5/00 (2006.01) B08B 5/02 (2006.01) B08B 7/00 (2006.01) B08B 7/04 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2440254

Apparatus and method for cleaning substrates. A substrate (11) is held and rotated by a chuck (12) and an atmospheric pressure plasma jet (13) places a plasma onto predetermined areas of the substrate (11). Subsequently liquid rinse (15) is sprayed onto the predetermined areas. In one embodiment, a nozzle sprays a gas onto the predetermined areas to assist in drying the predetermined areas when needed.

Dispositif et procédé servant à nettoyer des substrats. Un substrat (11) est maintenu et mis en rotation par un mandrin (12) et un jet de plasma (13) sous pression atmosphérique place le plasma sur des zones prédéterminées de ce substrat (11). Du liquide de rinçage (15) est ensuite pulvérisé sur ces zones prédéterminées. Dans un mode de réalisation, un gaz pulvérisé par un ajutage sur ces zones prédéterminées contribue au séchage éventuel desdites zones.

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