C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 15/00 (2006.01) C25D 5/08 (2006.01) C25D 7/04 (2006.01)
Patent
CA 2218784
A composite plating apparatus includes a cylindrical electrode which is positioned in a hollow section of a workpiece with a surrounding gap left therebetween. A plurality of through-holes are formed across the thickness of an outer wall of the cylindrical electrode. Composite plating liquid is jetted out through the through-holes and impinge on the inner surface of the hollow section to thereby produce turbulence. The turbulent liquid provides a uniform distribution of ceramic particles in the liquid. As a result, the ceramic particles can be co-deposited uniformly in a metallic matrix, and hence a uniform abrasion-resistant characteristic is obtained all over a resultant composite plating film.
Ishigami Osamu
Ishikawa Makoto
Ogawa Yoshimitsu
Dennison Associates
Honda Giken Kogyo Kabushiki Kaisha .)
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