C - Chemistry – Metallurgy – 01 – G
Patent
C - Chemistry, Metallurgy
01
G
31/1
C01G 45/00 (2006.01) A61L 9/01 (2006.01) B01D 53/34 (2006.01)
Patent
CA 1329982
ABSTRACT OF THE DISCLOSURE COMPOSITION CONTAINING DIVALENT MANGANESE ION AND METHOD FOR PREPARING THE SAME There is provided a composition containing divalent manganese and a method for preparing the compound. The compound is stable but has good activity and reactivity to be able to use as a deodorizer.
584658
Chief Resources Limited
Ikari Yoshikatsu
Kirby Eades Gale Baker
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