Composition for cleaning and polishing surfaces

Details Composition for cleaning and polishing surfaces Composition for cleaning and polishing surfaces

C - Chemistry, Metallurgy

09

G

C09G 1/12 (2006.01) C09G 1/04 (2006.01) C09K 3/10 (2006.01) C11D 7/28 (2006.01) C11D 7/50 (2006.01) C11D 7/60 (2006.01) C11D 7/24 (2006.01) C11D 7/26 (2006.01)

Patent

CA 2137052

The present invention refers to a composition for cleaning and polishing surfaces, particularly suitable for use to clean, polish and water- proof surfaces of different types of materials, having different superficial textures, which can be used without a previous washing or cleaning of the surface to be treated. The composition comprises from aproximately 1.0% to aproximately 1.5% in volume of hexane, from aproximately 0.5% to aproximately 0.8% in volume of pure silicon fluid, from aproximately 1.0% to aproximately 2.0% in volume of carnauba wax, from aproximately 0.5% to aproximately 1.0% in volume of an alyphatic glycol solvent and water, all amounts being with respect to the final volume of the composition.

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