C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
6/4
C23C 3/00 (1980.01)
Patent
CA 1159603
A B S T R A C T An organic solution of a composition consisting essentially of 100 parts by weight of an indium compound represented by the formula In(X)?(Y)m wherein X denotes a chelate ring formed by .beta.-diketones, esters of .beta.-keto-acids or the like, Y denotes an alkoxide formed by aliphatic alcohols or the like, and ? and m denote 1 or 2 having the relationship of ? + m = 3, and from 5 to 20 parts by weight of a tin compound represented by the formula Sn(X')2 or SN(Y')m' wherein X' denotes a chelate ring formed by .beta.-diketones or esters of .beta.-keto-acids, Y' denotes an alkoxide formed by aliphatic alcohols, and m' denotes 2 or 4, is suitable for deposition of transparent, hardened and low resistivity film coatings of tin-doped indium oxide on a substrate by means of the dip-coating method.
391633
Horie Yoshio
Maeda Umio
Shoji Hirofumi
Wada Yasusuke
Borden Ladner Gervais Llp
Nippon Soda Co. Ltd.
LandOfFree
Composition for depositing metallic oxide film coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Composition for depositing metallic oxide film coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Composition for depositing metallic oxide film coatings will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-299716