C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/44 (2006.01) B05D 5/06 (2006.01) B05D 7/24 (2006.01) C03C 17/245 (2006.01) C23C 14/08 (2006.01) C23C 14/22 (2006.01) G02B 1/11 (2006.01)
Patent
CA 2360617
The present applicationhas the object to provide a method for producing a composition for vapor deposition and to provide a composition for vapor deposition capable of forming a high-refraction layer even in low-temperature vapor deposition with it on a substrate and therefore ensuring an antireflection film having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance lowers little with time; and also to provide a method for producing an optical element having such an antireflection film. The objects of the invention are achieved by providing a method for producing a composition for vapor deposition, which comprises sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide; a composition for vapor deposition that contains titanium dioxide and niobium pentoxide; and a method for producing an optical element with an antireflection film, which comprises vaporizing the composition for vapor deposition and depositing a generated vapor on a substrate to form thereon a high-refraction layer of an antireflection film.
Kamura Hitoshi
Kobayashi Akinori
Mitsuishi Takeshi
Shinde Kenichi
Takahashi Yukihiro
Hoya Corporation
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