Composition useful for stripping photoresist polymers

Details Composition useful for stripping photoresist polymers Composition useful for stripping photoresist polymers

B - Operations, Transporting

08

B

149/12.1

B08B 3/08 (2006.01) H05K 3/06 (2006.01)

Patent

CA 1285463

ABSTRACT Photohardened resist masks are stripped from substrate surfaces, particularly metal surfaces of printed circuit boards, using a solution of at least one lower alkyl monoether of propylene glycol, at least one alkanolamine and at least one quaternary ammonium hydroxide compound. The solution may be diluted with water in an amount of up to about eighty percent of composition weight. If the composition contains any C2-6 alkanol, it is present in less than 5 percent by weight. 34,908-F

533853

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