D - Textiles – Paper – 06 – M
Patent
D - Textiles, Paper
06
M
D06M 15/41 (2006.01) D06M 15/507 (2006.01) D06M 23/04 (2006.01)
Patent
CA 2323552
The invention concerns a stain resist composition comprising: (a) a component selected from the group consisting of (1) an anionically modified phenol formaldehyde polymer comprising a phenol moiety and a formaldehyde moiety, (2) a naphthalene condensate, (3) a lignin sulfonate, (4) a phenol sulfonate derivative, a mixture thereof and (5) a (meth)acrylic polymer comprising residues of acrylic or methacrylic acid; and (b) a polyester.
L'invention concerne une composition résistant aux taches et comprenant: (a) un constituant choisi dans le groupe composé de (1) un polymère de phénol-formaldéhyde modifié par voie anionique et renfermant une fraction phénol et une fraction formaldéhyde, (2) un condensat de naphtalène, (3) un sulfonate de lignine, (4) un dérivé de sulfonate phénolique, un mélange de ceux-ci et (5) un polymère (méth)acrylique contenant des résidus d'acide acrylique ou d'acide méthacrylique; et (b) un polyester.
Collier Robert B.
Mull J. Todd
Arrow Engineering Inc.
Gowling Lafleur Henderson Llp
LandOfFree
Compositions and methods for imparting stain resistance does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Compositions and methods for imparting stain resistance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Compositions and methods for imparting stain resistance will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1995964