Compositions comprising fluoropolymers and amide functional...

C - Chemistry – Metallurgy – 08 – K

Patent

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C08K 5/20 (2006.01) C08J 5/18 (2006.01) C08K 5/132 (2006.01) C08K 5/3475 (2006.01) C08L 27/12 (2006.01)

Patent

CA 2325578

An ultraviolet light absorbing material that resists blooming and migration is made up of a fluoropolymer and an amide functional ultraviolet light absorbing compound, wherein the polymer and the amide functional ultraviolet light absorbing compound are hydrogen bonded to one another. Polymeric films that contain a polymeric matrix and the ultraviolet light absorbing material are useful as the top layer in multilayer constructions such as retroreflective sheetings and conformable marking sheets.

L'invention concerne un matériau absorbant le rayonnement ultraviolet qui résiste à l'irradiation et à la migration. Ce matériau se compose d'un fluoropolymère et d'un composé à fonction amide absorbant le rayonnement ultraviolet, le polymère et le composé étant liés par de l'hydrogène. Des films polymères contenant une matrice polymère et le matériau absorbant le rayonnement ultraviolet sont utiles comme couche supérieure dans des constructions multicouche telles que des feuilles rétroréfléchissantes et des feuilles de marquage conformables.

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