C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
167/254, 167/310
C07C 409/34 (2006.01)
Patent
CA 1184498
ABSTRACT A composition the treatment of acne in the form of a solution, lotion or cream containing from about 1 to 10% by weight of a compound of the formula Image wherein R3 is an alkyl having up to 6 carbon atoms or aryl having up to 10 carbon atoms and R1 and R2 are independently hydrogen, lower alkyl having up to 5 carbon atoms, phenyl, phenyl-lower alkyl, lower alkylphenyl, halogen, halophenyl, trifluoromethyl, triflouromethylphenyl, lower alkoxy, methylenedioxy, and lower alkoxyphenyl.
415108
Loev Bernard
Neiss Edward S.
Mcfadden Fincham
Usv Pharmaceutical Corporation
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