Compositions, halogenated compositions, chemical production...

C - Chemistry – Metallurgy – 07 – C

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C07C 21/18 (2006.01) A01K 31/02 (2006.01) A01N 29/02 (2006.01)

Patent

CA 2554029

Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCI(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant -CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCI group can be -CCI3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

L'invention concerne des compositions qui peuvent comprendre R¿F?(R¿T?)¿n?Q, formule I (I), formule II (II), et/ou R¿CI?(R¿T?)¿n?H. Le groupe R¿F? peut présenter quatre atomes de fluor, le groupe R¿T? peut comprendre un groupe C-2 présentant un groupe -CF¿3? latéral, n peut être au moins 1, le groupe R¿1? peut comprendre un atome de carbone, le groupe R¿CI? peut être -CCI¿3? et le groupe Q peut comprendre un ou plusieurs atomes du tableau périodique des éléments. L'invention concerne également des procédés de télomérisation.

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