Compositions of polyphenylene ether resin and high impact...

Details Compositions of polyphenylene ether resin and high impact... Compositions of polyphenylene ether resin and high impact...

C - Chemistry, Metallurgy

08

K

400/6305, 400/83

C08K 5/00 (2006.01) C08L 71/04 (1985.01)

Patent

CA 1272336

8CN-08143 COMPOSITIONS OF POLYPHENYLENE ETHER RESIN AND HIGH IMPACT POLYSTYRENE RESIN HAVING IMPROVED ULTRAVIOLET LIGHT RESISTANCE ABSTRACT OF THE DISCLOSURE The ultraviolet light stability of polyphenylene ether resins and blends is improved by the addition of small amounts of certain 2-hydroxy-4-hydroxylated alkyl ether benzophenones and hindered amines in combination. The benzophenones are specifically characterized by an alkoxy substituent which contains one or more pendent hydroxy groups. Comparison with the closest prior art shows better UV performance. Plasticized, flame retardant and filled versions are also disclosed.

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