C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
400/5309, 400/72
C08L 83/04 (2006.01) C08L 83/06 (2006.01) C08L 83/08 (2006.01)
Patent
CA 1321434
COMPOSITIONS WHICH CAN BE CROSSLINKED BY RADIATION TO FORM ELASTOMERS Abstract of the Disclosure Compositions which can be crosslinked by radiation to form elastomers comprising (a) an organopolysiloxane con- taining triorganosiloxane units of the formula H2C=CHCXOR1SiR2O? in which R is selected from monovalent hydrocarbon radicals and halogenated monovalent hydrocarbon radicals, R1 is selected from divalent hydrocarbon radicals and divalent halogenated hydrocarbon radicals and X is selected from oxygen and sulfur, in which at least 80 percent of the siloxane units other than the triorganosiloxane units are diorganosiloxane units, where the SiC-bonded organic radicals of the triorganosiloxane units and the diorganosiloxane units are selected from monovalent hydrocarbon radicals and halogenated monovalent hydrocarbon radicals, (b) a filler having a surface area of at least 50 m2/g, and if necessary (c) a photoinitiator, where the organo- polysiloxane (a) contains diorganosiloxane units in which one of the SiC-bonded organic radicals contains an aliphatic carbon-carbon double bond, and/or the compositions contain, in addition to components (a), (b) and if necessary (c), and at least one (d) organopolysiloxane resin containing units of the formulas R?SiO? and R2SiO3/2 and/or SiO4/2 where R2 is selected from monovalent hydrocarbon radicals, halogenated hydrocarbon radicals and hydrogen, with the proviso that at least an average of 4 Si-bonded hydrogen atoms are present in each molecule of the polysiloxane resins, in which siloxane units of the formula HSR1SiRO in an amount of from 0.1 to 5 such siloxane units per radical of the formula H2C=CHCXOR1, where R, R1 and X are the same as above, are excluded in organopolysiloxane (a) if the organopolysiloxane resin (d) is omitted from the compositions.
571985
Bosch Erhard
Burger Christa
Muller Johann
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Wacker-Chemie G.m.b.h.
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