C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 277/48 (2006.01) A61K 31/425 (2006.01) A61K 31/44 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) C07D 417/12 (2006.01)
Patent
CA 2084640
ABSTRACT OF THE DISCLOSURE The disclosure describes compounds of the formula: Image wherein R2 is hydrogen, or lower alkyl which may have suitable substituent(s), R3 is hydrogen, lower alkyl, lower alkoxy, or halogen, A is lower alkylene and Q is a group of the formula: -CO-R1 (in which R1 is an organic group), or carbamimidoyl which may have suitable substituent(s), with the proviso that when Q is carbamimidoyl which may have suitable substituent(s), then R3 is lower alkoxy, and pharmaceutically acceptable salts thereof. The preparation of these compounds, pharmaceutical compositions containing them, their use as antiulcer agent or H2- receptor antagonist and the prophylactic or therapeutic treatment of ulcer are also disclosed.
Inoue Yoshikazu
Katsura Yousuke
Takasugi Hisashi
Tomishi Tetsuo
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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