Compounds

C - Chemistry – Metallurgy – 07 – H

Patent

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167/185, 260/210

C07H 17/08 (2006.01) C07H 23/00 (2006.01) A61K 31/71 (1990.01)

Patent

CA 2005134

- 1 - 2654/abs Abstract Compounds of formula ( I ), or pharmaceutically acceptable salts thereof: Image (I) wherein R1 is -CH2OH; R2 is hydrogen or C1-8 alkyl; R3 is hydrogen or an amine protection group; and each R4 is hydrogen; their preparation, compositions containing them and their use in the treatment of fungal infections are described.

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