C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/208, 260/299
C07D 487/04 (2006.01) A61K 31/40 (2006.01) C07D 477/10 (2006.01)
Patent
CA 1244439
ABSTRACT OF THE DISCLOSURE A compound represented by the following formula: Image wherein R1 represents a hydrogen atom or a hydroxyl group, R2 represents a group of the formula -CH2NO2, Image or Image in which A represents a group of the formula Image Image or Image in which R4 represents a hydrogen atom or an alkoxycarbonyl group, R5 represents a phenyl, alkoxycarbonyl or alkanoyloxymethyl group, R6 represents an alkyl group and R7 represents a phenyl, naphthyl, pyridyl, furyl or thienyl group; and R3 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group, and a process for production thereof. The compounds have excellent antibacterial activity against various pathogenic microorganisms and have the ability to increase the antibacterial activity of known .beta.-lactam antibiotics against .beta.- lactamase-producing microorganisms.
442918
Fukagawa Yasuo
Ishikura Tomoyuki
Shimauchi Yasutaka
Yamamoto Kenichi
Yoshioka Takeo
Sanraku Incorporated
Smart & Biggar
LandOfFree
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