C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/83 (2006.01) C11D 3/20 (2006.01) C11D 3/43 (2006.01) C11D 11/00 (2006.01) C11D 1/06 (2006.01) C11D 1/29 (2006.01) C11D 1/66 (2006.01) C11D 1/72 (2006.01)
Patent
CA 2126269
Concentrated all-purpose liquid cleaning compositions are prepared that contain high levels of surfactants and solvents and exhibit improved cleaning performance and homogeneity in solution. A preferred formulation incorporates an actives system of a three component mixture: an anionic surfactant such as alkyl ethoxy sulfates, alkyl ethoxy carboxylates and mixtures thereof, a nonionic surfactant such as fatty alcohol ethoxylates, nonylphenol ethoxylates, alkylpolyglycosides and mixtures thereof, a glycol ether solvent and the balance comprising water and optional ingredients to provide a concentrated cleaning composition which can be diluted by the end user to the desired strength. Another preferred embodiment discloses a method of using a concentrated liquid cleaning composition.
Fisher Jeffrey J.
Haley Kalliopi S.
Amway Corporation
Kirby Eades Gale Baker
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