C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
96/169, 402/187
C08G 63/68 (2006.01) G03G 5/07 (2006.01)
Patent
CA 1179445
Abstract of the Disclosure Polymeric photoconductors are disclosed comprising n condensation polymer backbone contain ing, as repeating units, the condensation residues of 1) H diacid, and 2) an organic difunctional compound capable of undergoing condensation polymer- ization with said diacid, and an arylamine photocon- ductor group appended to at least one of said diacid or said organic difunctional compound residues. A preferred polymeric photoconductor is ionic and comprises a condensation copolymer containing, in addition to the above described repeating units, the condensation residue of a second diacid containing an anionic iminodisulfonyl or sulfo group. In certain embodiments, the ionic arylamine-containing polymers are water-dispersible copolyesters. The polymeric photoconductors described are useful in photoconductive compositions and elements. Electrophotographic processes employing such elements are also disclosed.
405947
Noonan John M.
Perlstein Jerome H.
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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