C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/231, 260/273
C07D 471/04 (2006.01) A61K 31/47 (2006.01) C07D 495/14 (2006.01)
Patent
CA 1306260
Abstract of the Disclosure A compound of the formula: Image (I) (wherein R is phenyl optionally substituted by one or two members selected from the group consisting of trifluoromethyl, C1-C? alkyl, C1-C6 alkoxy, C1-C5 alkylthio, nitro, amino C1-C5 alkanoylamino and C1-C?alkoxycarbonyl or 5- or 6-membered heterocyclic group optionally substituted by one or two members selected from the group consisting of halogen, C1-C5 alkyl and C1-C? alkoxy, Q is hydrogen, C1-C? alkyl, C1-C10 acyl, C1-C5 alkylsulfonyl or C?-C10 arylsulfonyl, Image is Image or Image R1, R2, R3, and R4 each is hydrogen, halogen C1-C?alkyl, C1-C5 alkoxy or C1-C5 haloalkyl, -82- Q is present on the nitrogen atom of the 1,3 or 5-poisition, and the dotted line indicates the presence of three double bonds at the position of 2, 3; 3a, 3b; 4, 5 / 1, 3b; 2, 3; 3a, 4 / or 1, 2; 3a, 3b; 4, 5) or its salt, being useful as psychostimulants or anxiolytics, is provided. -83-
520546
Eigyo Masami
Fujishita Toshio
Matsushita Akira
Sasatani Takashi
Takada Susumu
Johnson Douglas S. Q.c.
Shionogi & Co. Ltd.
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