Conductive coated semiconductor electrostatic deflection plates

Details Conductive coated semiconductor electrostatic deflection plates Conductive coated semiconductor electrostatic deflection plates

H - Electricity

01

J

317/3, 313/35.31

H01J 29/70 (2006.01) B41J 2/085 (2006.01) G01D 15/16 (2006.01) H01J 3/30 (2006.01) H01J 37/147 (2006.01)

Patent

CA 1270895

FI9-84-059 CONDUCTIVE COATED SEMICONDUCTOR ELECTROSTATIC DEFLECTION PLATES ABSTRACT An electrostatic deflection plate for charged particle beam systems is formed of a planar semiconductive substrate having a conductive region at the substrate surface. The conductive region is diffused or implanted into the body of the substrate, or one or more conductive lavers are deposited upon the substrate surface. The substrate material is preferably silicon and the diffused or implanted region is formed of a nonmagnetic, nonoxidizable metal such as gold or platinum. The deposited conductive region may be formed of a single layer of these or similar metals, one or more conductive underlayers with a nonmagnetic, nonoxidizable overlayer, a single or multilayer structure with a conductive oxide on the outermost layer, or a metallo-organic compound which forms a conductive layer during following heat treat- ment. The deflection plates are fabricated using conventional semiconductor processes and form durable structures which minimize eddy current effects.

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