C - Chemistry – Metallurgy – 10 – L
Patent
C - Chemistry, Metallurgy
10
L
C10L 3/10 (2006.01) C10G 21/00 (2006.01)
Patent
CA 2668875
Contemplated configurations and methods for gas processing use a refluxed absorber that receives a liquid and a vapor hydrocarbon feed. The absorber further receives a stripping medium that is at least in part formed from a vapor portion of a stabilizer overhead and also receives a scrubbing medium that is at least in part formed from a liquid portion of the stabilizer overhead. Most preferably, the absorber overhead is maintained at a temperature near or even below the hydrate point of the feed.
Selon la présente invention, les configurations et procédés pour le traitement de gaz utilisent un absorbeur chauffé au reflux qui reçoit un liquide et une alimentation d'hydrocarbure sous phase de vapeur. L'absorbeur reçoit en outre un milieu de distillation qui est au moins partiellement formé d'une portion de vapeur d'un stabilisateur aérien et reçoit également un milieu de frottement qui est au moins partiellement formé d'une portion liquide du stabilisateur aérien. Plus préférablement, l'absorbeur aérien est maintenu à une température proche ou même inférieure à la température d'hydrate de l'alimentation.
Fluor Technologies Corporation
Smart & Biggar
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