Contact planarization materials that generate no volatile...

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H01L 21/4763 (2006.01) B81C 1/00 (2006.01) C08G 59/68 (2006.01) C08L 63/00 (2006.01) H01L 21/312 (2006.01) H01L 21/3105 (2006.01)

Patent

CA 2462613

The present invention is directed towards planarization materials that produce little or no volatile byproducts during the hardening process when used in contact planarization process. The materials can be hardened by photo- orradiation or by heat during the planirization process, and they include one or more types of monomers, oligomers, or mixtures thereof, an optional cross- linker, and an optional organic reactive solvents. The solvent, if used, is chemically reacted with the monomers or oligomers and thus becomes part of the polymer matrix during the curing process. These materials can be used for damascene, dual damascene, bi-layer, and multi-layer applications, microelectromechanical system (MEMS), packaging, optical devices, photonics, optoelectronics, microelectronics, and sensor devices fabrication.

La présente invention concerne des matériaux de planarisation qui produisent peu ou pas de sous-produits volatiles pendant le processus de durcissement lors de leur utilisation dans des procédés de planarisation par contact. Les matériaux peuvent être durcis par photo-irradiation ou par la chaleur pendant le processus de planarisation. Ces matériaux comprennent un ou plusieurs types de monomères, oligomères ou mélanges de ces derniers, un agent de réticulation facultatif, et des solvants réactifs organiques facultatifs. Si ce solvant est utilisé, il réagit chimiquement avec les monomères ou les oligomères et fait ainsi partie de la matrice de polymères pendant le processus de durcissement. Ces matériaux peuvent être utilisés pour le damasquinage, le double damasquinage, les applications bi-couches et multiples couches, le système microélectromécanique, l'emballage, les dispositifs optiques, la photonique, l'optoélectronique, la micro-électronique, et la fabrication de dispositifs formant capteurs.

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