Control of the atmosphere in an enclosure

G - Physics – 05 – D

Patent

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341/38.5

G05D 16/20 (2006.01) B01L 1/04 (2006.01) F24F 11/00 (2006.01) F24F 11/02 (2006.01) G05B 15/02 (2006.01)

Patent

CA 1161140

ABSTRACT A method of controlling an atmosphere in an enclosure to which gas is being supplied includes the steps of monitoring two parameters, being atmospheric pressure within the enclosure and the rate of gas flow to or from the enclosure, comparing the monitored values of these parameters with respective adjustable set points to obtain pressure and rate of flow error values, deriving two or more variation values from the error values in accordance with pre-determined functions, and adjusting gas inflow and exhaust valves for the enclosure in dependence upon the variation values Also disclosed is an installation having a control system arranged to perform this method.

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