Control of the spatio-temporal uniformity of a pulsed gas...

H - Electricity – 01 – S

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H01S 3/097 (2006.01) H01J 1/00 (2006.01) H05G 1/00 (2006.01)

Patent

CA 2521491

The invention relates to the control of the spatio-temporal uniformity of a pulsed gas laser beam, especially generated by a high-power excimer laser. According to the invention, two raised lateral parts (111, 121) are provided on at least one of the discharge electrodes (101), said parts enabling the electrical discharge to be initialised at this level and to remain constantly stuck at this level after having spread over the entire surface of the electrode between said raised parts. In order to compensate for the lack of uniformity of the discharge created by the lack of uniformity of the electric field, the collimation mask (103) of the preionisation X-rays is thinned from the edges thereof towards the centre thereof in order to progressively reinforce the preionisation from the outer level of the discharge to the centre of the same. The invention enables a discharge to be obtained, and thus a plasma, which are both spatially uniform and temporally stable. The laser beam obtained from said plasma is thus uniform and stable itself.

L'invention concerne le contrôle de l'uniformité spatio-temporelle du faisceau d'un laser à gaz pulsé, notamment d'un laser à excimères de grande puissance. Elle consiste à prévoir sur l'une au moins des électrodes de décharge (101) deux parties latérales surélevées (111, 121), qui permette d'initialiser la décharge électrique à ce niveau et de l'y laisser constamment accrochée après qu'elle se soit étendue à la totalité de la surface de l'électrode comprise entre ces parties surélevées. Pour compenser le manque d'uniformité de la décharge créé par le manque d'uniformité du champ électrique, le masque de collimation (103) des rayons X de préionisation est aminci depuis ses bords jusque vers son centre pour renforcer la préionisation progressivement depuis le niveau extérieur de la décharge jusqu'au centre de celle-ci. Elle permet d'obtenir une décharge, et donc un plasma, à la fois uniformes dans l'espace et stables dans le temps. Le faisceau laser obtenu à partir de ce plasma et donc lui- même uniforme et stable.

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