Controlled flow vaporizer

Details Controlled flow vaporizer Controlled flow vaporizer

C - Chemistry, Metallurgy

23

C

122/36

C23C 16/54 (2006.01) C23C 16/448 (2006.01)

Patent

CA 1295896

CONTROLLED FLOW VAPORIZER Abstract A vaporizing apparatus delivers precisely con- trolled, substantially continuous and monitored vapor flows for uses such as in plasma enhanced vapor deposi- tion. The vaporizing apparatus comprises a fluid pas- sageway along which are a pumping means, a vaporizing means, and a flowing means, all in fluid communication with the passageway. The vaporizing means vaporizes liquid pumped from the pumping means and includes a heat sink layer, a heated layer, and a portion of the passageway sandwiched therebetween. The vaporizing apparatus can sustain a flow of organosilicon vapor at a flow rate of about 1 to about 100 SCCM for as long as desired.

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