Controlled vacuum arc material deposition, method and apparatus

Details Controlled vacuum arc material deposition, method and apparatus Controlled vacuum arc material deposition, method and apparatus

C - Chemistry, Metallurgy

23

C

204/96.08, 204/1

C23C 14/22 (2006.01) C23C 14/32 (2006.01) H01J 37/32 (2006.01)

Patent

CA 1247043

CONTROLLED VACUUM ARC MATERIAL DEPOSITION, METHOD AND APPARATUS ABSTRACT A method and apparatus for vacuum arc deposition of material on a surface of an object uses a vacuum chamber accommodating the active surface of the cathode and an anode. A power supply connected to the anode and cathode establishes an electric arc. The track of the arc is controlled with a magnetic field established with a perman- ent magnet that is moved in a closed path relative to the cathode. A solenoid modifies the main magnetic field produced on the active surface of the cathode.

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