C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/220
C08G 73/10 (2006.01) B05D 1/20 (2006.01) C08G 8/02 (2006.01) C08G 12/00 (2006.01) C08G 63/00 (2006.01) C08G 69/26 (2006.01) C08G 73/14 (2006.01) C08J 5/18 (2006.01)
Patent
CA 1294731
Abstract of the Disclosure A copolymeric amphiphilic polyimide precursor having the recurring unit of the formula (1): Image (1) wherein R1 is a tetravalent group having at least 2 carbon atoms, R2 is a bivalent group having at least 2 carbon atoms, and R3, R4, R5 and R6 are hydrogen atom or a monovalent group having 1 to 30 carbon atoms selected from the group consisting of an aliphatic group, an alicyclic group, an aromatic group, a group in which an aliphatic group is combined with an aromatic group, or an alicyclic group, and their groups substituted by a halogen atom, nitro group, amino group, cyano group, methoxy group or acetoxyl group, provided that at least one of R3, R4, R5 and R6 is neither hydrogen atom nor the above-mentioned group which has 1 to 11 carbon atoms; a part of at least one of said R1 and said R2 being substituted with a group having a valence different therefrom. The precursor of the present invention can provide thin films by the LB technique, and by ring closure of the obtained LB films, there can be obtained ultrathin films having excellent heat resistance, electric properties, chemical resistance and mechanical properties, and having a thickness of not more than 101000 .ANG., and if desired, a thickness of 10 to 1,000 .ANG.. Further, according to the process of the invention, polyimide thin films having a wide range of properties can be easily prepared. When a part of the group R2 is substituted with a trivalent or tetravalent group, the heat resistance can be improved since a ring having better heat resistance than an imide ring is formed.
535142
Awaji Hiroshi
Uekita Masakazu
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
Osler Hoskin & Harcourt Llp
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