C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 246/00 (2006.01) C08F 220/18 (2006.01) C08F 230/08 (2006.01) C09D 157/04 (2006.01) C09J 157/04 (2006.01) C09K 3/10 (2006.01)
Patent
CA 2142160
A free radical copolymer is essentially composed of a) from 30 to 99.99 % by weight of main monomers selected from the group consisting of C1-C20-alkyl (meth)acrylates, vinyl esters of carboxylic acids of up to 20 carbon atoms, vinylaromatics of up to 20 carbon atoms, ethylenically unsaturated nitriles, vinyl halides and aliphatic hydrocarbons having 2 to 8 carbon atoms and 1 or 2 double bonds, b) from 0.01 to 5 % by weight of a mixture of hydrolyzable sili- con compounds comprising b1) ethylenically unsaturated, copolymerizable silicon com- pounds and b2) saturated silicon compounds which are bonded as a regula- tor to the polymer skeleton in the copolymerization, in a weight ratio b1:b2 of from 0.01:1 to 1:0.01, and c) from 0 to 69.99 % by weight of monomers differing from a) and b), the stated weights being based on the copolymer and summing to 100 % by weight.
Bechert Bertold
Dittrich Uwe
Endisch Stefan
Glockner Martin
Mathauer Klemens
Basf Aktiengesellschaft
Robic
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